Table 1
Optical properties for as deposited and annealed in-situ doped LPCVD and PECVD poly-Si at 632 nm. Measured on a smooth surface (80 nm poly-Si deposition process for textured samples).
| LPCVD in-situ poly-Si (n) | PECVD in-situ a-Si (n) | |||||
|---|---|---|---|---|---|---|
| n | k | Thickness (nm) | n | k | Thickness (nm) | |
| As deposited | 4.0 | 0.09 | 110 | 4.5 | 0.22 | 100 |
| Annealed | 3.9 | 0.06 | 98+8 nm oxide | 3.9 | 0.06 | 90+8 nm oxide |
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