Table 1

Optical properties for as deposited and annealed in-situ doped LPCVD and PECVD poly-Si at 632 nm. Measured on a smooth surface (80 nm poly-Si deposition process for textured samples).

  LPCVD in-situ poly-Si (n) PECVD in-situ a-Si (n)
  n k Thickness (nm) n k Thickness (nm)
As deposited 4.0 0.09 110 4.5 0.22 100
Annealed 3.9 0.06 98+8 nm oxide 3.9 0.06 90+8 nm oxide

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