Table 1
Overview of the round-robin members, their technology and TOPCon layer properties.
| Description | ISE | IMEC | ISFH | ISC Konstanz | INES |
|---|---|---|---|---|---|
| Technique | PECVD | LPCVD | LPCVD | LPCVD | LPCVD |
| Deposition tool | Centrotherm c.PLASMA |
Tempress SPECTRUM |
Centrotherm Europe 2000 |
Centrotherm | Semco Smartech |
| Deposition side | single | both | both | both | both |
| Doping process | in-situ | ex-situ, POCl3 diffusion |
in-situ | in-situ | ex-situ (PIII) |
| Doping tool (only ex-situ) | Tempress SPECTRUM |
IBS Pulsion Solar |
|||
| Interfacial oxide | thermal | thermal | chemical | chemical | thermal |
| Poly-Si thickness | 150 nm | 160 nm | 200 nm | 150 nm | 200 nm |
| Doping (cm−3) | 1.7 × 1020 | 2–3 × 1020 | 2 × 1020 | 2 × 1020 | 4–5 × 1020 |
| Anneal temperature | 900 °C | 860 °C | 860 °C | 825 °C | 975 °C |
| Capping layer | SiNx PECVD (75 nm) | SiNx PECVD (85 nm) | AlOx ALD, SiNx PECVD (10 nm, 80 nm) | SiNx PECVD (70 nm) | SiNx PECVD (70 nm) |
Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.
Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.
Initial download of the metrics may take a while.