Table 2

Lifetime of symmetric samples from Batches 2 and 3 on FZ wafers with wet SiOx\(p +) μc-Si before and after deposition of SiNx:H (no annealing step).

SiOx layer Before SiN After SiN
RF-PECVD 5 μs 6 μs
Wet-chemical 67 μs 909 μs

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