Table 2
Lifetime of symmetric samples from Batches 2 and 3 on FZ wafers with wet SiOx\(p +) μc-Si before and after deposition of SiNx:H (no annealing step).
| SiOx layer | Before SiN | After SiN |
|---|---|---|
| RF-PECVD | 5 μs | 6 μs |
| Wet-chemical | 67 μs | 909 μs |
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