Influence of chamber condition on the Raman crystallinity and refractive index at 632 nm of deposited μc-SiOx:H p- and n-layers.
|Chamber conditioning||μc-SiOx:H p-layer||μc-SiOx:H n-layer|
|layer material||Raman Fc (%)||nm||Raman Fc (%)||nm|
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