Table 2

Influence of chamber condition on the Raman crystallinity and refractive index at 632 nm of deposited μc-SiOx:H p- and n-layers.

Chamber conditioning μc-SiOx:H p-layer μc-SiOx:H n-layer

layer material Raman Fc (%) nm Raman Fc (%) nm

a-Si:H 55.3 3.30 28.1 2.51
μc-SiOx:H 51.4 3.26 26.7 2.42

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