Download original image
Optical emission spectra measured during chamber cleaning in an Ar/NF3 etch plasma. The clean/etch start is shown on top and the end on the bottom of the figure. F line intensities increase after the end point of the etching process.
Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.
Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.
Initial download of the metrics may take a while.