Volume 10, 2019
Topical Issue: From advanced materials and technologies to multiscale integration and usages
|Number of page(s)||5|
|Section||Semiconductor Thin Films|
|Published online||15 July 2019|
Low-temperature deposition of TiO2 by atmospheric pressure PECVD towards photoanode elaboration for perovskite and solid-state dye-sensitized solar cells
Université de Limoges, CNRS, IRCER, UMR 7315, 87000 Limoges, France
2 Université de Limoges, CNRS, XLim, UMR 7252, 87000 Limoges, France
* e-mail: email@example.com
Received in final form: 8 June 2019
Accepted: 12 June 2019
Published online: 15 July 2019
An original low-temperature atmospheric pressure plasma-enhanced chemical vapor deposition process was used to deposit titanium dioxide thin films. The parametric study in dynamic mode deposition aimed at growing an ideal columnar film composed of aligned anatase monocrystals as solar cell photoanode, previously obtained on silicon wafers in static mode deposition. A process parameters optimization was necessary to deposit onto thermally sensitive glass/FTO substrates. In this paper, the morphology, crystallinity and optical transmission of the coatings have been studied. The coatings display a columnar cauliflower-like structure, composed of TiO2 amorphous particles assembly. After deposition, the light transmission properties of the substrate were reduced. As a solution, an ultrasound bath cleaning was set up to enhance the transmitted light through the photoanode.
Key words: Atmospheric pressure / plasma-enhanced chemical vapor deposition / microwave plasma torch / Titanium dioxide / perovskite solar cells
© A. Perraudeau et al., published by EDP Sciences, 2019
This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/4.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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