Low-temperature deposition of TiO2 by atmospheric pressure PECVD towards photoanode elaboration for perovskite and solid-state dye-sensitized solar cells

Topical Issue: From advanced materials and technologies to multiscale integration and usages

Open Access

Fig. 4

FESEM images of films elaborated with the different gas flow rates combinations ([TTIP flow rate]_[Ar plasma flow rate]) on glass/FTO substrates, from the plasma phase with the higher TTIP proportion (left) to the lower proportion.

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