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Fig. 2


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Illustration of the photolithography process. Glass/molybdenum substrates (1) are spin-coated with a positive photoresist (2). The resulting stack is exposed to UV light, throughout a laboratory-designed photomask (3). The soluble photoresist is washed away during the development (4). The unprotected molybdenum is etched with K3[Fe(CN)6] solution (5). The unsoluble photoresist is finally removed in aceton (6).

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