Table 1

Sample process conditions for polished (P1 to P4) and textured (T1 to T4) wafers using two phosphorus implantation doses (D1 and D2 = 1.25D1) and two annealing durations at 850 °C (τ, 2τ).

Annealing conditions Implantation dose

  D1 D2 = 1.25 × D1
None P1 (Polished) T1 (Textured)
Standard time τ at 850 °C P2 (Polished) T2 (Textured)
Double time 2τ at 850 °C P3 (Polished) T3 (Textured) P4 (Polished) T4 (Textured)

Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.

Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.

Initial download of the metrics may take a while.