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The morphologies of high rate films etched with one step in HF solution or HCl solution or with two steps first in HF solution and then in HCl solution. The HF etching time / HCl etching time are: (a) 0 s/0 s, (b) 120 s/0 s, (c) 120 s/2 s, (d) 120 s/8 s, (e) 120 s/16 s, (f) 0 s/50 s.
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