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Fig. 5


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AFM images of etch evolution upon HF etching for ZnO:Al film deposited at 350 °C. AFM images correspond to different etching time in diluted HF solution: (a) 0 s, (b) 60 s, (c) 90 s, (d) 120 s, (e) 150 s, (f) 180 s.

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