Volume 4, 2013
|Number of page(s)||5|
|Section||Optics of Thin Films, TCOs|
|Published online||04 February 2013|
Precise microstructuring of indium-tin oxide thin films on glass by selective femtosecond laser ablation
1 Fraunhofer Center for Silicon Photovoltaics CSP, Walter-Hülse-Str. 1, 06120 Halle (Saale), Germany
2 Institute of Physics, Martin Luther University of Halle-Wittenberg, Heinrich-Damerow-Str. 4, 06120 Halle (Saale), Germany
3 Department of Electrical Engineering, South Westphalia University of Applied Sciences, Lübecker Ring 2, 59494 Soest, Germany
4 Centre for Innovation Competence SiLi-nano®, Martin Luther University of Halle-Wittenberg, Karl-Freiherr-von-Fritsch-Str. 3, 06120 Halle (Saale), Germany
Received: 11 October 2012
Published online: 4 February 2013
Transparent conductive oxide (TCO) thin films were removed from glass substrates using femtosecond laser pulses. Irradiating through the glass, the threshold for complete TCO ablation was much lower than for front-side irradiation. Additionally, the former method created almost rectangular cross-sectional groove profiles despite the Gaussian laser beam. This indicates a non-thermal ultrafast ablation mechanism via critical carrier concentration achieved by the femtosecond pulse in the TCO at the interface. Very narrow scribes of only 5 μm width provided very good electrical separation, making this technique very attractive for micro-structuring applications like scribing of thin-film solar cells.
© Krause et al., published by EDP Sciences, 2013
This is an Open Access article distributed under the terms of the Creative Commons Attribution-Noncommercial License 2.0 (http://creativecommons.org/licenses/by-nc/2.0/), which permits unrestricted use, distribution, and reproduction in any noncommercial medium, provided the original work is properly cited.
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