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Cited article:

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UV-Induced Synthesis of Hybrid HMDSO/SiO2 Thin Films with Compositional Gradients for High-Performance Atomic Oxygen Resistance

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ACS Applied Materials & Interfaces 15 (41) 48810 (2023)
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The role of plasma technology in barrier coating deposition

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Reviews of Modern Plasma Physics 6 (1) (2022)
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Organosilicon films deposited in low-pressure plasma from hexamethyldisiloxane — A review

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Quasi-fivefold symmetric electron diffraction patterns due to multiple twinning in silicon thin films grown from hexamethyldisiloxane

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Journal of Applied Crystallography 49 (6) 2226 (2016)
https://doi.org/10.1107/S1600576716016848