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Cited article:

Optical evaluation of doping concentration in SiO₂ doping source layer for silicon quantum dot materials

T. Zhang, I. Perez-Wurlf, B. Berghoff, S. Suckow, G. Conibeer

EPJ Photovolt., 2 (2011) 25001

Published online: 2011-09-29

DOI: https://doi.org/10.1051/epjpv/2011024

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Plasma electrolytic oxidation of monocrystalline silicon using silicate electrolyte containing boric acid

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