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Cited article:

Chemical and morphological characterization of photoactive SiOx films electrodeposited on Pt substrate

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Journal of Electroanalytical Chemistry 832 311 (2019)
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Structural characterization of the interface structure of amorphous silicon thin films after post-deposition argon or hydrogen plasma treatment

Alex Neumüller, Oleg Sergeev, Martin Vehse and Carsten Agert
Applied Surface Science 403 200 (2017)
https://doi.org/10.1016/j.apsusc.2017.01.188

Spectroscopic characterization and photoactivity of SiO x -based films electrochemically grown on Cu surfaces

Agata Krywko-Cendrowska, Laurent Marot, Laetitia Philippe, et al.
Journal of Applied Electrochemistry 47 (8) 917 (2017)
https://doi.org/10.1007/s10800-017-1089-7

Electrodeposition and Characterization of SiOxFilms Photoactive in Organic Solution

A. Krywko-Cendrowska, L. Marot, M. Strawski, R. Steiner and E. Meyer
Journal of The Electrochemical Society 163 (3) D100 (2016)
https://doi.org/10.1149/2.0411603jes

Shrinking of silicon nanocrystals embedded in an amorphous silicon oxide matrix during rapid thermal annealing in a forming gas atmosphere

M van Sebille, A Fusi, L Xie, et al.
Nanotechnology 27 (36) 365601 (2016)
https://doi.org/10.1088/0957-4484/27/36/365601