Table 3

Implied Voc of symmetric samples from Batches 2 and 3 on FZ wafers with wet SiOx\(p +) μc-Si before and after deposition of SiNx:H (no annealing step).

SiOx layer Before SiN After SiN
RF-PECVD 549 mV 558 mV
Wet-chemical 619 mV 693 mV

Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.

Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.

Initial download of the metrics may take a while.