Table 4

Parameters extraction on SiO2/Al2O3 stacks.

Stack type Vfb (V) Q fixed Dit (cm-2 eV-1) τeff (μs) Seff,max
(cm-2) (Terman method) @ Δn = 2 × 1015 (cm s-1)

Al2O3(15 nm ± 0.1 nm) 1.6 −(8.3−8.7) × 1012 (2.4−3.1) × 1011 1110 9
SiO2(8 nm ± 1 nm) −0.65 −(3.9−4.4) × 1011 (6.4−8.2) × 1010 2320 4
+ Al2O3 (15 nm ± 0.1 nm)
SiO2(20 nm ± 1 nm) −0.1 −(1.4−2.2) × 1011 (1.6−2.3) × 1010 316 32
+ Al2O3 (15 nm ± 0.1 nm)

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