Open Access

Table 1

Modelling of the experimental output parameters of HIT structure solar cells on N-type c-Si wafer at 300 K, having different thickness of the I-pm-Si:H layer on the emitter side (denoted by A, B, C, D). Nss (DL) is the defect density on that surface of the c-Si wafer that faces the emitter. J0 is the reverse saturation current density and n0 the diode ideality factor calculated from the experimental and model generated dark J-V characteristics.

Cell I-pmSi:H Nss (DL) J sc V oc FF Efficiency J 0 n 0
name thickness (nm) (cm-2) (mA cm-2) (mV) (%) (mA cm-2)

A 2.5 9.2 × 1011 Expt. 30.3 679 0.755 15.5 2.70 × 10-8 1.30
Model 31.2 673 0.758 15.9 2.41 × 10-8 1.57

B 3.3 6.6 × 1011 Expt. 30.8 683 0.767 16.1 1.60 × 10-7 1.43
Model 31.0 684 0.765 16.2 1.78 × 10-7 1.77

C 4.0 4.5 × 1011 Expt. 30.8 701 0.796 17.2 1.90 × 10-7 1.49
Model 31.1 701 0.807 17.6 1.10 × 10-7 1.42

D 4.5 1.6 × 1011 Expt. 30.6 706 0.732 15.8 5.90 × 10-8 1.40
Model 30.3 706 0.738 15.8 4.95 × 10-8 1.67

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