Ultra-thin crystalline silicon films produced by plasma assisted epitaxial growth on silicon wafers and their transfer to foreign substrates

Open Access

Fig. 7

(Color online) Raman spectrum of an ultra-thin c-Si film over a chromium/polyimide substrate. The left inset shows the Im [ε] spectra of the film grown on c-Si before its detachment from the c-Si wafer while the right inset shows the sample after being removed from the c-Si wafer.

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